Study on the fabrication of low-gradient photoresist grating masks

Quan Liu; Hua Wan; Jianhong Wu; Xinrong Chen; Chaoming Li

doi:10.1117/12.755101

4 January 2008 Study on the fabrication of low-gradient photoresist grating masks

Quan Liu, Hua Wan, Jianhong Wu, Xinrong Chen, Chaoming Li

Proceedings Volume 6832, Holography and Diffractive Optics III; 68320X (2008) https://doi.org/10.1117/12.755101
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

To alleviate the difficulty of ion beam etching, it is essential to acquire the low gradient holographic photoresist grating masks as well as the high gradient ones (i.e. the rectangular holographic photoresist grating masks). According to the ion beam etching experiments, the low gradient photoresist grating masks can effectively eliminate the redeposition. The control of the profile of holographic photoresist grating masks is investigated in this paper. Considering the effects of developing time and temperature of the developer on the response of photoresist and adopting the combination of computer simulation and experiments, a low gradient photoresist grating mask: 30% duty cycle at bottom and 65° gradient can be fabricated. The study indicates the increase of the developing time causes the diminish of the threshold volume of exposure while the increase of the slope of the linearity of photoresist response; the rise of the temperature of the developer leads to both the increase of the threshold volume of exposure and the slope of the linearity of photoresist response. As a result non-1:1 interferential exposure and low-temperature development are required in the fabrication of low gradient photoresist grating masks. The 1:7 interferential exposure and 15°C- development have been adopted in this experiment.

Citation Download Citation

Quan Liu, Hua Wan, Jianhong Wu, Xinrong Chen, and Chaoming Li "Study on the fabrication of low-gradient photoresist grating masks", Proc. SPIE 6832, Holography and Diffractive Optics III, 68320X (4 January 2008); https://doi.org/10.1117/12.755101

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available