Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew J. Hazelton; Shinji Wakamoto; Shigeru Hirukawa; Martin McCallum; Nobutaka Magome; Jun Ishikawa; Céline Lapeyre; Isabelle Guilmeau; Sébastien Barnola; Stéphanie Gaugiran

doi:10.1117/12.771914

7 March 2008 Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew J. Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

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Proceedings Volume 6924, Optical Microlithography XXI; 69240R (2008) https://doi.org/10.1117/12.771914
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Double patterning (DP) has now become a fixture on the development roadmaps of many device manufacturers for half pitches of 32 nm and beyond. Depending on the device feature, different types of DP and double exposure (DE) are being considered. This paper focuses on the requirements of the most complex forms of DP, pitch splitting, where line density is doubled through two exposures, and sidewall processes, where a deposition process is used to achieve the final pattern. Budgets for CD uniformity and overlay are presented along with tool and process requirements to achieve these budgets. Experimental results showing 45 nm lines and spaces using dry ArF lithography with a k1 factor of 0.20 are presented to highlight some of the challenges. Finally, alternatives to double patterning are presented.

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Andrew J. Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, and Stéphanie Gaugiran "Double patterning requirements for optical lithography and prospects for optical extension without double patterning", Proc. SPIE 6924, Optical Microlithography XXI, 69240R (7 March 2008); https://doi.org/10.1117/12.771914

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