Fabrication and characterization of 3D pn junction structure for radiation detection

Tingting Liu; Tao Liu; Jinlong Li; Jilei Lin; Xiaoming Chen; Xinglong Guo; Peisheng Xin; Shaohui Xu; Weijia Xue; Lianwei Wang

doi:10.1117/12.792237

11 March 2008 Fabrication and characterization of 3D pn junction structure for radiation detection

Tingting Liu, Tao Liu, Jinlong Li, Jilei Lin, Xiaoming Chen, Xinglong Guo, Peisheng Xin, Shaohui Xu, Weijia Xue, Lianwei Wang

Author Affiliations +

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69843M (2008) https://doi.org/10.1117/12.792237
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

In this report, p-type macroporous silicon has been prepared by anodization. A phosphorus diffusion step is employed for the formation of three dimensional pn junction structures on this macroporous silicon. I-V and C-V measurement were employed to characterize the electrical properties. The results were compared with numeric simulation with T-SUPREM4 and MEDICI. It has been demonstrated that three-dimensional structure can increase the effective junction area and the collective efficiency remarkably, and hence improve the performance of semiconductor radiation detector.

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Tingting Liu, Tao Liu, Jinlong Li, Jilei Lin, Xiaoming Chen, Xinglong Guo, Peisheng Xin, Shaohui Xu, Weijia Xue, and Lianwei Wang "Fabrication and characterization of 3D pn junction structure for radiation detection", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69843M (11 March 2008); https://doi.org/10.1117/12.792237

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