Paper
29 April 2008 Laser removal of thin layers for surface cleaning
Ileana Apostol, D. Apostol, V. Damian, Iuliana Iordache, F. Garoi, E. Capello
Author Affiliations +
Proceedings Volume 7007, INDLAS 2007: Industrial Laser Applications; 70070I (2008) https://doi.org/10.1117/12.801968
Event: INDLAS 2007: Industrial Laser Applications, 2007, Bran, Romania
Abstract
In micro- and nano- device fabrication technology, localized material removal is one of the basic operations for structure formation. Classical methods for structure formation on the surface of a silicon wafer are based mainly on chemical processing, starting with photo etching, chemical etching, and chemical-mechanical linearization. In order to propose new methods of higher quality from the point of view of both environment protection and processing quality, we have studied the possibility of thin films controlled removal under the action of laser radiation. We are presenting some qualitative results of laser induced surface removal of polymer thin films, of interest for microelectronic industry (e.g. photoresist), under the action of different laser sources. As laser sources we have used the most spread and commercially available laser systems with different wavelengths and pulse lengths in order to compare their action on the surfaces and to establish the characteristic parameters for removal of thin layers for surface cleaning.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ileana Apostol, D. Apostol, V. Damian, Iuliana Iordache, F. Garoi, and E. Capello "Laser removal of thin layers for surface cleaning", Proc. SPIE 7007, INDLAS 2007: Industrial Laser Applications, 70070I (29 April 2008); https://doi.org/10.1117/12.801968
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photoresist materials

Thin films

Pulsed laser operation

Silicon

Semiconducting wafers

Laser ablation

Semiconductor lasers

Back to Top