Paper
9 September 2008 Behaviors of fracture toughness of thin transparent glass for liquid crystal display by EB irradiation
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Abstract
An influence of electron beam (EB) irradiation on the crack generation and propagation of transparent glasses are studied by using a standard indentation fracture method. The thin (less than 0.5mm) transparent glass is used for substrate of more than 100 inches crystal liquid display. However, it is difficult to product ultra thin and large-size substrate without fracture. Therefore, these glasses have been expected to enhance the fracture toughness of substrate for the displays. As results, EB irradiation, which is one of short-time treatments of dry process at low temperature, increases the crack nucleation energy of these glasses, although the EB irradiation does not change the crack propagation energy of these glasses. The EB irradiation generates dangling bonds in these glasses. Partial relaxation of the residual strain occurs around these dangling bonds in the silica network structure. If the inter-atomic distance of the stronger metal-oxygen pairs becomes optimum on the potential curve of these glasses, the relaxation increases the bonding energy of the network structure. Evidently, the enhancement of crack nucleation energy is mainly due to an increase in the bonding energy for the stronger metal-oxygen atomic pairs in the atomic network structure, as well as the relaxation of the network structure.
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Keisuke Iwata, Akira Tonegawa, and Yoshitake Nishi "Behaviors of fracture toughness of thin transparent glass for liquid crystal display by EB irradiation", Proc. SPIE 7039, Nanoengineering: Fabrication, Properties, Optics, and Devices V, 70390Q (9 September 2008); https://doi.org/10.1117/12.794784
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KEYWORDS
Glasses

Silica

Electron beams

Chemical species

LCDs

Liquid crystals

Beam propagation method

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