Site-specific dual ink dip pen nanolithography

Omkar A. Nafday; Jason R. Haaheim; Fredy Villagran; Tom Levesque

doi:10.1117/12.818918

11 May 2009 Site-specific dual ink dip pen nanolithography

Omkar A. Nafday, Jason R. Haaheim, Fredy Villagran, Tom Levesque

Proceedings Volume 7318, Micro- and Nanotechnology Sensors, Systems, and Applications; 73180A (2009) https://doi.org/10.1117/12.818918
Event: SPIE Defense, Security, and Sensing, 2009, Orlando, Florida, United States

Abstract

The ability to deposit two different materials with nanoscale precision at user specified locations is a very important attribute of dip pen nanolithography (DPN). However, the potential of DPN goes beyond simple deposition since DPN used in conjunction with lateral force microscopy (LFM) allows site-specific investigations of nanoscale properties. In this work, we use two different inks, 16-Mercaptohexadecanoic acid (MHA) and 1-octadenethiol (ODT) to show sitespecific dual ink DPN enabled exclusively by our proprietary software. A diamond-dot pattern was created by using a layer-to-layer alignment (LLA) algorithm which enables the MHA (diamond) to be written concentric with the ODT (central dot) pattern. This simple demonstration of multi-ink DPN is not specific to alkanethiol ink systems, but is also applicable to other multi-material patterning, interaction and exchange studies.

Citation Download Citation

Omkar A. Nafday, Jason R. Haaheim, Fredy Villagran, and Tom Levesque "Site-specific dual ink dip pen nanolithography", Proc. SPIE 7318, Micro- and Nanotechnology Sensors, Systems, and Applications, 73180A (11 May 2009); https://doi.org/10.1117/12.818918

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