Paper
20 August 2009 (SiC)x(AlN)1-x solid-solution grown by physical vapor transport (PVT) method
N. B. Singh, B. Wagner, A. Berghmans, D. J. Knuteson, S. McLaughlin, D. Kahler, M. King, J. Hedrick, G. M. Bates
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Abstract
(SiC)x (AlN)1-x Solid-solution films were deposited on on-axis Si-face 4H-SiC (0001) substrates by the physical vapor transport (PVT) method. Attempts were made to dope this film with Nd+3 for high power laser applications. SiC or its alloys will have better properties compared to oxides because of extremely high thermal conductivity and damage threshold. The doped film was characterized for its quality by X-ray, Photoluminescence (PL) and scanning electron microscope (SEM). X-ray rocking curves showed that crystals with FWHM of less than 200 arc seconds could be grown. The results were compared with previous results published on rare earth doped SiC material. Effect of annealing at high temperature on PL characteristics is also reported.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. B. Singh, B. Wagner, A. Berghmans, D. J. Knuteson, S. McLaughlin, D. Kahler, M. King, J. Hedrick, and G. M. Bates "(SiC)x(AlN)1-x solid-solution grown by physical vapor transport (PVT) method", Proc. SPIE 7420, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications III, 742004 (20 August 2009); https://doi.org/10.1117/12.827260
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KEYWORDS
Silicon carbide

Crystals

Luminescence

Annealing

Aluminum nitride

Scanning electron microscopy

X-rays

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