Analysis of film thickness for magnetron sputtering system with more than one workbench

Tao Wang; He Yu; Zhiming Wu; Yadong Jiang; Jing Jiang

doi:10.1117/12.837841

30 November 2009 Analysis of film thickness for magnetron sputtering system with more than one workbench

Tao Wang, He Yu, Zhiming Wu, Yadong Jiang, Jing Jiang

Proceedings Volume 7506, 2009 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 75062B (2009) https://doi.org/10.1117/12.837841
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

In this article, the thickness uniformity of thin films deposited by magnetron sputtering system involved in both planetary circumrotate model and traditional model by rectangle target were investigated respectively. It was shown that the thickness uniformity of films by magnetron sputtering system with rotation and revolution at the optimum ratio value of Wz/Wg 0.5 is superiority to traditional system which with 0.3 of thickness relative deviation at coordinative condition. Moreover, the relative deviation was dropped as the addition of distance from substrate to target. The results were in accord with that obtained experimentally.

Citation Download Citation

Tao Wang, He Yu, Zhiming Wu, Yadong Jiang, and Jing Jiang "Analysis of film thickness for magnetron sputtering system with more than one workbench", Proc. SPIE 7506, 2009 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 75062B (30 November 2009); https://doi.org/10.1117/12.837841

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