Laser scattering based identification of micro-surface conditions for the inspection of solar cell wafer

Yeon Ki Hong; Gyung Bum Kim; Young-Jun Jin

doi:10.1117/12.839933

17 February 2010 Laser scattering based identification of micro-surface conditions for the inspection of solar cell wafer

Yeon Ki Hong, Gyung Bum Kim, Young-Jun Jin

Author Affiliations +

Proceedings Volume 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV; 758411 (2010) https://doi.org/10.1117/12.839933
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

In this paper, micro-surface roughness has been experimentally identified using laser scattering images. At first, previous surface evaluation methods, laser scattering parameters and optical deflected rays are investigated and then laser scattering inspection mechanism is developed. Its optimum parameters on grinding surfaces are selected using a design of experiment. It is shown that the mean of vertical scattering distributions is characterized as wavelet in laser scattering images with the selected optimal parameters. Also, the dominant feature of laser scattering distributions is linearly increased according to grinding surface roughness and so the information can be used as important factor for the measurement and evaluation of various surface roughnesses. The proposed laser scattering method is applied to the evaluation inspection of crystalline silicon wafer surfaces for solar cell.

Citation Download Citation

Yeon Ki Hong, Gyung Bum Kim, and Young-Jun Jin "Laser scattering based identification of micro-surface conditions for the inspection of solar cell wafer", Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV, 758411 (17 February 2010); https://doi.org/10.1117/12.839933

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