LPP source system development for HVM

David C. Brandt; Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Alexander N. Bykanov; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Kevin M. O'Brien; Wayne J. Dunstan

doi:10.1117/12.848404

20 March 2010 LPP source system development for HVM

David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, Wayne J. Dunstan

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76361I (2010) https://doi.org/10.1117/12.848404
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source to support optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and of prototype source operation at a leading scanner manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data is presented. An electricity consumption model is described, and our current product roadmap is shown.

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David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, and Wayne J. Dunstan "LPP source system development for HVM", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361I (20 March 2010); https://doi.org/10.1117/12.848404

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