Response Surfaces As A Tool For Optimizing Proximity Corrections

D. H. Leebrick; T. R. Witt; O. B. Long

doi:10.1117/12.940367

30 June 1987 Response Surfaces As A Tool For Optimizing Proximity Corrections

D. H. Leebrick, T. R. Witt, O. B. Long

Proceedings Volume 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI; (1987) https://doi.org/10.1117/12.940367
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Proximity correction in electron beam lithography is essential to obtain the best performance in the submicron regime. Several parameters are required to achieve good correction and their interaction is complex. This paper describes the use of response surface analysis to optimize those parameters values. The effect of individual parameters as well as the result of optimized parameters will be shown for the case of e-beam exposed optical positive resist.

Citation Download Citation

D. H. Leebrick, T. R. Witt, and O. B. Long "Response Surfaces As A Tool For Optimizing Proximity Corrections", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940367

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available