On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes

Stephan Junger; Wladimir Tschekalinskij; Nanko Verwaal; Norbert Weber

doi:10.1117/12.874785

1 March 2011 On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes

Stephan Junger, Wladimir Tschekalinskij, Nanko Verwaal, Norbert Weber

Author Affiliations +

Proceedings Volume 7946, Photonic and Phononic Properties of Engineered Nanostructures; 79461D (2011) https://doi.org/10.1117/12.874785
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

Sub-wavelength gratings and hole arrays in metal films are applicable for polarization and spectral selective sensors, respectively. We demonstrate the fabrication of wire grid polarizers using standard complementary metal-oxide semiconductor (CMOS) processes. Extraordinary optical transmission of hole arrays was achieved by using the dedicated layer of a modified CMOS process. The structures were simulated using the finite-difference time-domain (FDTD) method and fabricated using the work flow of integrated circuits. A high-speed polarization image sensor with a pixel size of 6 μm was designed and demonstrated, and multispectral sensing was implemented using nanostructures with different spectral filter performances on a single chip.

Citation Download Citation

Stephan Junger, Wladimir Tschekalinskij, Nanko Verwaal, and Norbert Weber "On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes", Proc. SPIE 7946, Photonic and Phononic Properties of Engineered Nanostructures, 79461D (1 March 2011); https://doi.org/10.1117/12.874785

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