Paper
20 April 2011 3D features measurement using YieldStar, an angle resolved polarized scatterometer
Author Affiliations +
Abstract
Metrology on 3D features like contact holes (CH) is more challenging than on lines and spaces (L/S) structures especially if one wants to have profile information. Scatterometry has been widely used on L/S structures and has enabled characterization of lithographic features providing with critical dimensions (CD) as well as feature height and side wall angle. In this paper, we will present the application of scatterometry to the measurement of 3D structures using an angle resolved polarized scatterometer: ASML YieldStar S-100. Contact hole measurements will be presented and correlation to standard metrology tools will be shown. Measurement capability will be discussed in terms of reproducibility, calculation time, sensitivity of the parameters of interest and correlation between them leading to a proper model choice. Finally initial results on more complex 3D features (line ends, brick walls,...) will be presented.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, and Mircea Dusa "3D features measurement using YieldStar, an angle resolved polarized scatterometer", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79712E (20 April 2011); https://doi.org/10.1117/12.881276
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
3D metrology

Metrology

Critical dimension metrology

Lithography

Scanning electron microscopy

Scatterometry

Scatter measurement

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