PN junction fabrication of solar cells and integration with metamaterials

Amarachukwu Enemuo; David T. Crouse; Michael Crouse

doi:10.1117/12.887124

17 May 2011 PN junction fabrication of solar cells and integration with metamaterials

Amarachukwu Enemuo, David T. Crouse, Michael Crouse

Proceedings Volume 8070, Metamaterials VI; 80700W (2011) https://doi.org/10.1117/12.887124
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

Silicon is the primary material used for the fabrication of solar cells and it is responsible for about 40% of the cost. Metamaterials show promise in enhancing the performance of silicon solar cells thus, improving the efficiency. Here we report on the fabrication of a broadband, antireflective, conductive metamaterial capable of channeling light into a solar cell. As a precursor to making the metamaterial, standard p-n junctions were fabricated. Conventional phosphorus oxychloride (POCl₃) furnace diffusion was used to create the p-n junction. When the p-n junction was forward biased, the measured current exhibited a diode characteristic. The measured photocurrent response yielded an open circuit voltage for the p-n junction at 0.48 VDC. The metamaterial film was fabricated, placed atop the p-n junction and characterized. Initial tests showed that the metamaterial antireflective properties were on par with those of standard industrial single-layer silicon nitride coatings. Further testing is being performed to assess the full optical and electrical performance of the metamaterial film.

Citation Download Citation

Amarachukwu Enemuo, David T. Crouse, and Michael Crouse "PN junction fabrication of solar cells and integration with metamaterials", Proc. SPIE 8070, Metamaterials VI, 80700W (17 May 2011); https://doi.org/10.1117/12.887124

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