Verification of scatterometer design

Wenjing Zhao; Cornelius Hahlweg; Hendrik Rothe

doi:10.1117/12.893511

20 September 2011 Verification of scatterometer design

Wenjing Zhao, Cornelius Hahlweg, Hendrik Rothe

Proceedings Volume 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V; 810509 (2011) https://doi.org/10.1117/12.893511
Event: SPIE NanoScience + Engineering, 2011, San Diego, California, United States

Abstract

Scatterometric applications demand strategies for the selection from the various basic scatterometer principles as well as detailed design rules to fit the final optical instrument, the data processing and user interface into the requirements of the application in scope. In recent years we proposed methods based on the optical properties of various basic measurement structures to support the synthesis process for scatterometers, including the decision for the structure itself. In continuation of last years paper on design rules for catadioptric scatterometers the present paper is dedicated to the metrological verification of the proposed design methods for devices with elliptical mirrors in off-axis alignment. Further questions of data processing and analysis, especially the necessary coordinate transformations and calibration procedures will be discussed, practical examples included.

Citation Download Citation

Wenjing Zhao, Cornelius Hahlweg, and Hendrik Rothe "Verification of scatterometer design", Proc. SPIE 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V, 810509 (20 September 2011); https://doi.org/10.1117/12.893511

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