Analysis of microstructure heights error of multilayer diffractive optical elements for far infrared optical system

Liangliang Yang; Qingfeng Cui; Changxi Xue; Tao Liu

doi:10.1117/12.904799

5 December 2011 Analysis of microstructure heights error of multilayer diffractive optical elements for far infrared optical system

Liangliang Yang, Qingfeng Cui, Changxi Xue, Tao Liu

Author Affiliations +

Proceedings Volume 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 81970D (2011) https://doi.org/10.1117/12.904799
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China

Abstract

In this paper, the effect of the relative microstructure heights error on the diffraction efficiency of multilayer diffractive optical elements (MLDOEs) is considered. Based on the relationship of diffraction efficiency and diffractive microstructure height, the analysis result of the relative microstructure height error on the diffraction efficiency of MLDOEs for 8-14μm far infrared optical system was present. It is shown that the diffraction efficiency over the whole waveband is above 98.94% for double-layer DOEs when the two relative microstructure heights error are equal and both controlled within ±2%. However, the diffraction efficiency drops quickly when the two relative microstructure heights error changed in the opposite sign. The analysis result can be used for analyzing the effects of microstructure heights error on diffraction efficiency for MLDOEs working in infrared optical system.

Citation Download Citation

Liangliang Yang, Qingfeng Cui, Changxi Xue, and Tao Liu "Analysis of microstructure heights error of multilayer diffractive optical elements for far infrared optical system", Proc. SPIE 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 81970D (5 December 2011); https://doi.org/10.1117/12.904799

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