Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

Daniel Andruczyk; John Sporre; Dan Elg; Tae Cho; David N. Ruzic

doi:10.1117/12.916437

23 March 2012 Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

Daniel Andruczyk, John Sporre, Dan Elg, Tae Cho, David N. Ruzic

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832237 (2012) https://doi.org/10.1117/12.916437
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.

Citation Download Citation

Daniel Andruczyk, John Sporre, Dan Elg, Tae Cho, and David N. Ruzic "Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832237 (23 March 2012); https://doi.org/10.1117/12.916437

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