Design of planar lightwave interleavers based on Echelle gratings structure

Wenkai Liu; Baoqun Li; Xiaowei Dong

doi:10.1117/12.981789

27 November 2012 Design of planar lightwave interleavers based on Echelle gratings structure

Wenkai Liu, Baoqun Li, Xiaowei Dong

Proceedings Volume 8555, Optoelectronic Devices and Integration IV; 855524 (2012) https://doi.org/10.1117/12.981789
Event: Photonics Asia, 2012, Beijing, China

Abstract

This paper reports the design procedure of planar lightwave interleavers based on Echelle gratings structure, introduces two methods to eliminate the device aberration, two-point aberration-free design and elliptical grating facets design. Simulation results show that the device insertion loss and crosstalk can be effectively reduced by aberration compensation design. Design example is given in this paper. The 50/100GHz and 100/200GHz interleavers are fabricated on the SOI (Silicon-on-insulator) materials. As compared to other solutions, they are smaller and compact in structure.

Citation Download Citation

Wenkai Liu, Baoqun Li, and Xiaowei Dong "Design of planar lightwave interleavers based on Echelle gratings structure", Proc. SPIE 8555, Optoelectronic Devices and Integration IV, 855524 (27 November 2012); https://doi.org/10.1117/12.981789

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