Paper
19 February 2014 Optomechanics with high-contrast gratings
Utku Kemiktarak, Corey Stambaugh, Haitan Xu, Jacob Taylor, John Lawall
Author Affiliations +
Proceedings Volume 8995, High Contrast Metastructures III; 89950P (2014) https://doi.org/10.1117/12.2044712
Event: SPIE OPTO, 2014, San Francisco, California, United States
Abstract
High-contrast gratings fabricated in free-standing membranes of silicon nitride are a remarkable new platform for optomechanics, as they combine high reflectivity, low mass, and a high mechanical quality factor in a single device. In an effort to further improve on our earlier designs, we are now fabricating high-contrast gratings from stoichiometric silicon nitride. The new gratings have a diameter of 80 μm, a thickness of 250 μm, and are patterned in square membranes from 100 μm to 500 μm on a side. We find reflectivities R < 0.994 for these devices, and fundamental mechanical resonance frequencies above 1.5 MHz. In addition, we have incorporated HCGs fabricated from low-stress silicon nitride into a “membrane-in-the-middle” setup, and observe that the cavity transmission spectrum is distorted from a constant free spectral range of 3 GHz to one characterized by anticrossings separated by 72 ± 2 MHz.
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Utku Kemiktarak, Corey Stambaugh, Haitan Xu, Jacob Taylor, and John Lawall "Optomechanics with high-contrast gratings", Proc. SPIE 8995, High Contrast Metastructures III, 89950P (19 February 2014); https://doi.org/10.1117/12.2044712
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KEYWORDS
Silicon

Reflectivity

Absorption

Optomechanical design

Optical design

Refraction

Semiconducting wafers

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