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17 April 2014 A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source (Withdrawal Notice)
Sangsul Lee, Manuel Guizar-Sicairos, Yasin Ekinci
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Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 904811 (2014) https://doi.org/10.1117/12.2046226
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States
Abstract
Publisher's Note: This paper, originally published on April 17, 2014, was withdrawn at the author's request on May 25, 2016.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Sangsul Lee, Manuel Guizar-Sicairos, and Yasin Ekinci "A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source (Withdrawal Notice)", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904811 (17 April 2014); https://doi.org/10.1117/12.2046226
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Cited by 2 scholarly publications and 6 patents.
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KEYWORDS
Photomasks
Extreme ultraviolet
Extreme ultraviolet lithography
Reflectivity
Diffraction
Inspection
Sensors
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