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The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in Optical Metrology and Inspection for Industrial Applications III, edited by Sen Han, Toru Yoshizawa, Song Zhang, Proceedings of SPIE Vol. 9276 (SPIE, Bellingham, WA, 2014) Article CID Number. ISSN: 0277-786X ISBN: 9781628413496 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2014, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/14/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print and on CD-ROM. Papers are published as they are submitted and meet publication criteria. A unique, consistent, permanent citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:
The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. Numbers in the index correspond to the last two digits of the six-digit CID Number. AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Aketagawa, Masato, 1C Cao, Hui-bin, 1P Cao, YangYang, 0A Cen, Zhaofeng, 1L Chen, Dong, 0I Chen, Guang, 0L Chen, Siwen, 0T Cheng, Xiaosheng, 1H Cheng, Xu, 08, 1D Cui, Haihua, 1H Dai, Fengzhao, 17 Dai, Junfei, 0C Dai, Ning, 1H Dai, Xianglu, 25 Ding, Keqin, 0L Ding, Quanxin, 0S Dong, Hao, 1W Fan, Junliu, 1Q, 1S Faridian, Ahmad, 02 Feng, Qibo, 0L Filatov, Yuri V., 26 Fu, Yuegang, 0Y Gan, Haiyong, 15 Gao, Jingjing, 19 Gao, Peng, 1M Gao, Sitian, 0T Gong, Chen, 0Q Gu, Yonggang, 1I Guan, Xin, 0U Gui, Hua-qiao, 0A, 1P Guo, Changye, 1H Guo, Fudong, 17 Guo, Qinghua, 0W Guo, Zhenglai, 0Y Han, Sen, 0M, 0Y, 1O He, Wantao, 1D He, Yingwei, 1G Hiratsuka, Shun, 0G Hofherr, O., 0V Hou, Zhiling, 0N Huang, Lu, 1R Huang, PingXian, 1L Huang, Shujun, 04 Huang, Zhe, 0A Jiang, Hongzhi, 1A Jiang, Yu, 0Z Jin, Hongzhen, 1K Jin, Yuan, 1L Kamakura, Yoshihisa, 0G Ke, Jun, 19 Kettel, Johannes, 09 Larichev, Roman A., 26 Lei, Z., 24 Li, Beiwen, 0Q Li, Da, 0F Li, Dong, 1X, 1Y Li, Dongsheng, 0T Li, Guowei, 13 Li, Haipeng, 1G Li, Huijun, 0K Li, Jian, 15 Li, Jianwei, 15 Li, Lichun, 05 Li, Mengyuan, 10 Li, Mingyang, 03 Li, Qi, 0T Li, Shi, 0T Li, Tongbao, 1R Li, Wei, 0T Li, Xiaotong, 1L Li, Xuan, 20 Li, Xudong, 1A Li, Xue, 0N Li, Xueyuan, 0Y Li, Xunwu, 1S Li, Yan, 1T, 1U Li, Yang, 1W Li, Yanjie, 25 Li, Yong, 17 Li, Yong, 1K, 1M Li, ZhongWei, 08, 0D, 0J, 1D, 1J Liao, Yunjiang, 1A Lin, Gui-Wen, 1X Lin, Ke, 0K Liu, Chun-Yang, 1Y Liu, Cuiling, 0K Liu, Dingpu, 1G Liu, Hua, 0S Liu, Jian-guo, 1P Liu, Jun, 1N Liu, Xiuying, 1R Liu, Yang, 1A Liu, Yong, 03 Liu, Zhenghao, 0K Liu, Zhongyou, 1R Lu, Yunjun, 17 Lu, Zhuliang, 1R Ma, Hui, 0F Meng, Fangfang, 1U Meng, Haifeng, 1G Müller, Claas, 09, 0V Nakamura, Katsumasa, 0G Ni, Kai, 1W Ning, D., 24 Novak, Matt, 0I Osten, Wolfgang, 02 Ou, Jinping, 20 Pedrini, Giancarlo, 02 Qian, Jin, 1R Reinecke, Holger, 09, 0V Ren, Peng, 20 Schmit, Joanna, 0I Shang, Desheng, 05 Shi, Chengying, 1G Shi, YuSheng, 08, 0D, 0J, 1D Shi, Yushu, 0T Singh, Alok Kumar, 02 Situ, Guohai, 13, 1N Song, Xu, 0T Stover, John C., 0M Sun, Hao, 0Y Sun, Haojie, 10 Sun, Jun, 05 Sun, Weimin, 0Z Tang, Feng, 17 Tao, Wei, 1Z Tian, Jin-Dong, 1X, 1Y Tu, Yanshuai, 1K Wachten, C., 0V Wakayama, Toshitaka, 0G Wan, Wenhui, 05 Wan, Xiulong, 17 Wang, Congjun, 0D Wang, Huan-qin, 0A, 1P Wang, Jian, 1K, 1M Wang, Jianbo, 1R Wang, Jie, 1P Wang, Jun, 1Q, 1S Wang, Qian, 19 Wang, Xiangzhao, 17 Wang, Xioahui, 0N Wang, Xuanze, 0U Wang, Youqing, 1Q Wei, Dong, 1C Wei, Haoyun, 1T Wei, Ping, 19 Wei, Yifan, 0W Weng, Jinping, 1H Wu, Guanhao, 1W Wu, Mengqi, 0J Wu, Quanying, 1N, 1O, 1Q, 1S Wu, Xuejian, 1U Wu, Yuxiang, 03 Wuhe, Z., 24 Xi, Jiangtao, 0K, 0W Xia, Zemin, 1J Xiao, Suzhi, 1Z Xie, Huimin, 25 Xu, Kun, 1O Xu, Liang, 1G Xu, Mingfei, 1W Xu, Nan, 15 Xu, Xiaobin, 1N Xu, Yinghui, 05 Yan, Hao, 1Z Yan, Yunxiang, 0Z Yang, Liangen, 0U Yang, Yixin, 0A Yi, Jingya, 03 Yin, Cong, 1R Yin, Yongkai, 0W Yoshizawa, Toru, 0G Yu, Yanguang, 0K, 0W Yue, Huimin, 03 Zeng, Maomao, 0F Zeng, Nan, 0F Zhai, Chao, 1I Zhai, Zhongsheng, 0U Zhan, Guomin, 08, 0J Zhang, Dawei, 10 Zhang, Qican, 0N Zhang, Qiyuan, 1O Zhang, Song, 0C, 0Q Zhang, Wei, 05 Zhang, Zhiliang, 1M Zhang, Zhixin, 15 Zhang, Zonghua, 04 Zhao, Can, 1D Zhao, HengShuang, 08 Zhao, Hui, 1Z Zhao, Huijie, 1A Zhao, Mantong, 22 Zhao, Shijie, 1T Zheng, Guoquan, 04 Zheng, Jianchao, 0Z Zhong, Kai, 0D, 0J, 1D, 1J Zhou, Fan, 1G Zhou, Jianliang, 05 Zhou, Liwei, 0S Zhou, Qian, 1W Zhou, Xiaohui, 0D Zhou, Yao, 23 Zhou, Zhi, 20 Zhu, Jianrong, 0Y Zhu, Ye, 1I Zhuang, Jie, 10 Symposium CommitteesGeneral Chairs General Co-chairs
Technical Program Chairs
Technical Program Co-chairs
Local Organizing Committee Chair Local Organizing Committee Co-chairs
General Secretary Local Organizing Committee
Conference CommitteeConference Chairs
Conference Program Committee
Session Chairs
IntroductionThis is the proceedings of the conference on Optical Metrology and Inspection for Industrial Applications III that was held as part of SPIE/COS Photonics Asia (in Beijing, China, 9–11 October 2014). This conference focuses on methods, analysis, and applications of optical metrology and inspection that have been applied to various industries with a particular emphasis on the manufacturing industry. The field of optical metrology and inspection has rapidly grown to wide acceptance for many industrial applications. For example, the requirement from industry realized high-speed and downsized measurement systems, and advances in machine/robot vision have provided compact and smart camera systems, new lighting systems, and better ways of data transfer. Non-contact methods based on optical imaging principles have been seen wide use in the mechanical engineering and electronics industry, and also made advances in traditional manufacturing areas such as automotive and aerospace manufacturing. These methods are also being used for defect and flaw inspection, and precision measurements. Recent computing power has made analysis methods such as phase-shifting a viable tool for fast on-line inspection for process control and metrology applications. This conference is intended to address the latest advances and future developments in the areas of optical metrology and inspection as they are applied to practical applications in various industries. In these proceedings, papers submitted to the conference are presented in the following eight sessions: Optical Metrology Methods I to VI and Optical Metrology Applications I and II, and one Poster Session. In addition to optical principles and techniques, imaging methods and analysis techniques have also become more and more popular in practical applications due to rapid advanced computational processing methods, camera systems and device technologies including various optoelectrical elements and devices. In the next conference scheduled in 2016, more papers are expected to be presented in those areas as well. Sen Han Toru Yoshizawa Song Zhang |
