Design and performance of a wide-angle infrared plasmonic absorber

Xianshun Ming; Qiaofeng Tan

doi:10.1117/12.2067776

21 August 2014 Design and performance of a wide-angle infrared plasmonic absorber

Xianshun Ming, Qiaofeng Tan

Proceedings Volume 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 92830U (2014) https://doi.org/10.1117/12.2067776
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

We study theoretically and experimentally a wide-angle infrared absorber constituting of a periodic array of rectangular metal patches on a thick metal layer, which were spaced by an ultrathin dielectric layer. We use a cavity plasmon resonator (CPR) model to describe the cavity mode field distribution in the absorber analytically and to analyze the resonant conditions and resonant absorption. A plasmonic absorber with square patches is numerically simulated and analyzed based on the CPR model, which shows that the absorption of the absorber is independent of the azimuth angle and remains high at moderate incident angles (θ ≤ 60° ) for both p and s polarizations. The dependence of the resonant wavelength and absorption on the geometric parameters and material of the structure is also investigated, with some design principles proposed for the parameter choice. As a proof-of-principle experiment, we design, fabricate and measure a sample, which shows over 85.7% absorption in the incident angle range of 20°~50° around the wavelength 1160nm for p-polarized incidence, and over 70% absorption around the wavelength 1135 nm for s-polarized incidence.

Citation Download Citation

Xianshun Ming and Qiaofeng Tan "Design and performance of a wide-angle infrared plasmonic absorber", Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 92830U (21 August 2014); https://doi.org/10.1117/12.2067776

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