HVM readiness of nanoimprint lithography templates: defects, CD, and overlay

Koji Ichimura; Kouji Yoshida; Saburo Harada; Takaharu Nagai; Masaaki Kurihara; Naoya Hayashi

doi:10.1117/12.2175483

19 March 2015 HVM readiness of nanoimprint lithography templates: defects, CD, and overlay

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 94230D (2015) https://doi.org/10.1117/12.2175483
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Performances of the nanoimprint lithography templates were discussed considering the readiness toward the high volume manufacturing of nanoimprint lithography application along with the requirement for the templates and its fabrication process. The current status of the three major performances of the templates was shown.

Citation Download Citation

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, and Naoya Hayashi "HVM readiness of nanoimprint lithography templates: defects, CD, and overlay", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230D (19 March 2015); https://doi.org/10.1117/12.2175483

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