Room temperature deposition of highly dense TiO2 thin films by filtered cathodic vacuum arc

E. Guillén; I. Heras; G. Rincón Llorente; F. Lungwitz; M. Alcon-Camas; R. Escobar-Galindo

doi:10.1117/12.2189503

20 August 2015 Room temperature deposition of highly dense TiO₂ thin films by filtered cathodic vacuum arc

E. Guillén, I. Heras, G. Rincón Llorente, F. Lungwitz, M. Alcon-Camas, R. Escobar-Galindo

Proceedings Volume 9558, Nanostructured Thin Films VIII; 95580S (2015) https://doi.org/10.1117/12.2189503
Event: SPIE Nanoscience + Engineering, 2015, San Diego, California, United States

Abstract

A systematic study of TiO2 films deposited by dc filtered cathodic vacuum arc (FCVA) was carried out by varying the deposition parameters in a reactive oxygen atmosphere. The influence of the oxygen partial pressure on film properties is analyzed. Composition was obtained by Rutherford backscattering spectroscopy (RBS) measurements, which also allow us to obtain the density of the films. Morphology of the samples was studied by scanning electron microscopy (SEM) and their optical properties by ellipsometry. Transparent, very dense and stoichiometric TiO2 films were obtained by FCVA at room temperature.

Conference Presentation

Citation Download Citation

E. Guillén, I. Heras, G. Rincón Llorente, F. Lungwitz, M. Alcon-Camas, and R. Escobar-Galindo "Room temperature deposition of highly dense TiO₂ thin films by filtered cathodic vacuum arc", Proc. SPIE 9558, Nanostructured Thin Films VIII, 95580S (20 August 2015); https://doi.org/10.1117/12.2189503

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