Composite materials and nanoporous thin layers made by atomic layer deposition

Lilit Ghazaryan; Ernst-Bernhard Kley; Andreas Tünnermann; Adriana Szeghalmi

doi:10.1117/12.2192972

23 September 2015 Nanoporous SiO₂ made by atomic layer deposition and atomic layer etching

Lilit Ghazaryan, Ernst-Bernhard Kley, Andreas Tünnermann, Adriana Szeghalmi

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96270P (2015) https://doi.org/10.1117/12.2192972
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

In this study, Al₂O₃:SiO₂ composite films were grown using atomic layer deposition (ALD) with the thicknesses of Al₂O₃ and SiO₂ being between 1 Å - 20 Å. The composition of the films was varied by changing the relative number of ALD cycles from 1 to 20. The optical properties of the layers were investigated with spectroscopic ellipsometry (SE). The experimental refractive indices of the composite films with Al₂O₃ and SiO₂ ALD cycles of 1-10 were shown to be higher than the calculated values. This was attributed to the hampered growth of the SiO₂ during the first ALD cycles. On the other hand, the experimental and calculated refractive indices of the mixture 20 cycles:20 cycles agreed very well indicating a nanolaminate behavior. Selective etching of the alloys 1:1 and 2:2 resulted in a nanoporous SiO₂ films. The refractive index of the final porous SiO2 films was dependent on the thickness of the initial alloy layer.

Citation Download Citation

Lilit Ghazaryan, Ernst-Bernhard Kley, Andreas Tünnermann, and Adriana Szeghalmi "Nanoporous SiO₂ made by atomic layer deposition and atomic layer etching", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270P (23 September 2015); https://doi.org/10.1117/12.2192972

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