Optical monitoring of high throughput ion beam sputtering deposition

Ove Lyngnes; Ulf Brauneck; Jinsong Wang; Ralf Erz; Sandeep Kohli; Binyamin Rubin; James Kraus; David Deakins

doi:10.1117/12.2194090

23 September 2015 Optical monitoring of high throughput ion beam sputtering deposition

Ove Lyngnes, Ulf Brauneck, Jinsong Wang, Ralf Erz, Sandeep Kohli, Binyamin Rubin, James Kraus, David Deakins

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 962715 (2015) https://doi.org/10.1117/12.2194090
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

Ion Beam Sputtering (IBS) offers a deposition process yielding optical thin films with stable optical parameters, near bulk density, and ppm level optical loss. Recently higher throughput systems with higher deposition rate and larger substrate fixtures have been developed. The higher deposition rates make accurate layer control essential. This is most readily achieved by using an optical monitoring system (OMS).

Multiple optical bandpass, edge filters and notch filters have been deposited in a high throughput IBS system with four 333mm diameter planetary using both a single wavelength (SWLOMS) as well as a broadband OMS (BBOMS). A wavelength repeatability of less than 0.1% for five subsequent short wave pass filters is demonstrated. Results for a multi notch filter coated using the BBOMS are also presented. A control strategy utilizing a mix of a broadband and a single wavelength model was used successfully in the deposition.

Spectral performance of multiple bandpass filters using turning point control is presented. A 2D mapping of a 15nm FWHM bandpass filter centered at 830nm shows a +/-0.05% variation in the center wavelength across the central 180mm diameter and a +/-0.35nm variation in the FWHM to the edge of the wafer. A variation of the standard turning point monitoring that enables control of filters with narrower bandwidth than the spectral resolution of the OMS system has been developed. A 0.8nm FWHM bandpass filter centered at 532nm controlled using a BBOMS with a ~1.5nm FWHM spectral resolution of the spectrometer is demonstrated.

Citation Download Citation

Ove Lyngnes, Ulf Brauneck, Jinsong Wang, Ralf Erz, Sandeep Kohli, Binyamin Rubin, James Kraus, and David Deakins "Optical monitoring of high throughput ion beam sputtering deposition", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962715 (23 September 2015); https://doi.org/10.1117/12.2194090

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