Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses

Dam Bé L. Douti; Laurent Gallais; Christophe Hecquet; Thomas Bégou; Julien Lumeau; Mireille Commandré

doi:10.1117/12.2192983

2 October 2015 Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses

Dam Bé L. Douti, Laurent Gallais, Christophe Hecquet, Thomas Bégou, Julien Lumeau, Mireille Commandré

Author Affiliations +

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 962718 (2015) https://doi.org/10.1117/12.2192983
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

We report on the sub-picosecond laser-induced damage of optical thin films of different thickness made by Magnetron sputtering, Ion assisted deposition and Ion plating, and submitted to single irradiation of the first and the third harmonics of an Ytterbium laser (1030 and 343nm). Using a single rate equation approach for free electron excitation coupled with calculation of the spatial and temporal distribution of the electric field, we investigate numerically the spatial density distribution of the absorbed energy and evaluate its capacity to describe damage phenomena especially damage threshold and morphologies (damage diameter, ablation deepness). Laser-induced damage thresholds are compared for different film thicknesses and different irradiation conditions.

Citation Download Citation

Dam Bé L. Douti, Laurent Gallais, Christophe Hecquet, Thomas Bégou, Julien Lumeau, and Mireille Commandré "Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962718 (2 October 2015); https://doi.org/10.1117/12.2192983

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