Investigation of the atomic emission spectroscopy of F atoms and CF2 molecules in CF4 plasma processing

Huiliang Jin; Jie Li; Caixue Tang; Wenhui Deng; Xianhua Chen

doi:10.1117/12.2243979

28 October 2016 Investigation of the atomic emission spectroscopy of F atoms and CF2 molecules in CF4 plasma processing

Huiliang Jin, Jie Li, Caixue Tang, Wenhui Deng, Xianhua Chen

Proceedings Volume 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 96830F (2016) https://doi.org/10.1117/12.2243979
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

The surface chemistry reaction involved in the processing of Atmospheric Pressure Plasma Jet (APPJ) produced from CF₄ precursor has been explored. The atomic emission spectroscopy of F atoms and CF₂ molecules was investigated as they contribute to substrate etching and FC film formation during APPJ processing. Optical emission spectroscopy (OES) spectra were acquired for CF₄ plasma, relative concentrations of excited state species of F atoms and CF₂molecules were also dependent upon plasma parameters. The densities of F atoms increased dramatically with increasing applied RF power, whereas CF₂ molecules decreased monotonically over the same power range, the subsequent electron impacted decomposition of plasma species after CF₄ precursor fragmentation. The spectrum of the F atoms and CF₂ molecules fallowed the same tendency with the increasing concentration of gas CF₄, reaching the maximum at the 20sccm and 15sccm respectively, and then the emission intensity of reactive atoms decreased with more CF₄ molecules participating. Addition certain amount O₂ into CF₄ plasma resulted in promoting CF₄ dissociation, O₂ can easily react with the dissociation product of CF₂ molecules, which inhibit the compound of the F atoms, so with the increasing concentration of O₂, the concentration of the CF₂ molecules decreased and the emission intensities of F atoms showed the maximum at the O₂/CF₄ ratio of 20%. These results have led to the development of a scheme that illustrates the mechanisms of surface chemistry reaction and the affection of plasma parameters in CF₄ plasma systems with respect to F and CF₂ gas-phase species.

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Huiliang Jin, Jie Li, Caixue Tang, Wenhui Deng, and Xianhua Chen "Investigation of the atomic emission spectroscopy of F atoms and CF2 molecules in CF4 plasma processing", Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830F (28 October 2016); https://doi.org/10.1117/12.2243979

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KEYWORDS

Plasma

Chemical species

Molecules

Oxygen

Emission spectroscopy

Molecular spectroscopy

Fluorine

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