Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Roberto Fallica; Jason K. Stowers; Andrew Grenville; Andreas Frommhold; Alex P. G. Robinson; Yasin Ekinci

doi:10.1117/12.2219193

18 March 2016 Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Roberto Fallica, Jason K. Stowers, Andrew Grenville, Andreas Frommhold, Alex P. G. Robinson, Yasin Ekinci

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 977612 (2016) https://doi.org/10.1117/12.2219193
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called Chemical Sensitivity to account for all the post-absorption chemical reaction ongoing in the resist, which is also predicts a quantitative clearing volume, and respectively clearing radius, due to the photon absorption in the resist. These parameters may help in deeper insight into the underlying mechanisms of EUV concept of clearing volume and clearing radius are then defined and quantitatively calculated.

Citation Download Citation

Roberto Fallica, Jason K. Stowers, Andrew Grenville, Andreas Frommhold, Alex P. G. Robinson, and Yasin Ekinci "Dynamic absorption coefficients of CAR and non-CAR resists at EUV", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977612 (18 March 2016); https://doi.org/10.1117/12.2219193

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