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13 June 2022 Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope
Nicholas Jenkins, Michael Tanksalvala, Yuka Esashi, Henry C. Kapteyn, Margaret M. Murnane
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Proceedings Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC1205306 (2022) https://doi.org/10.1117/12.2612098
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
We implement an elegant hardware upgrade in our EUV imaging reflectometer to significantly reduce noise from beam power fluctuations. Our instrument non-destructively characterizes the composition and morphology of samples both transversely and depth-resolved, by implementing an EUV coherent diffractive imaging (CDI) microscope in a variable-angle reflection geometry. This upgrade significantly improves signal-to-noise ratio (SNR) by using an EUV beam splitter to simultaneously monitor the beam intensity before and after reflection from the sample. Fluctuations in power may then be normalized out, resulting in greatly improved SNR — an enhancement of ~6x in our first, non-optimized implementation.
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Nicholas Jenkins, Michael Tanksalvala, Yuka Esashi, Henry C. Kapteyn, and Margaret M. Murnane "Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope", Proc. SPIE PC12053, Metrology, Inspection, and Process Control XXXVI, PC1205306 (13 June 2022); https://doi.org/10.1117/12.2612098
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KEYWORDS
Extreme ultraviolet
Reflectometry
Beam splitters
Cameras
CCD cameras
CCD image sensors
Metrology
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