In this study we examined a series of model EUV resists varying in photoacid generator, PAG, or photodecomposable quencher, PDQ loading and their effects on resist uniformity using Nano-Projectile Secondary Ion Mass Spectrometry, NP-SIMS. The EUV resists we examined consisted of a 40:60 random co-polymer of polytertbutylmethacrylate and polyhydroxylstyrene. NP-SIMS analysis revealed changes in the film composition evidenced by changes in both the abundance of characteristic secondary ions and homogeneity of analyte species. The resists were loaded with varying amounts of PAG – triphenylsulfonium and perfluorobutylsulfonium, and PDQ- triphenylsulfonium and p-cyanobenzoate. Examining different formulations before and after treatment revealed differences in homogeneity of the resist and differences in resist performance.
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