The EUV optical constants of high and low density diamond-like carbon: mask blanks and pellicles

Mohammad Saghayezhian; Jojo Daof; Katrina Rook; Antonio Checco; Meng Lee; Marjorie Chee

doi:10.1117/12.2687690

22 November 2023 The EUV optical constants of high and low density diamond-like carbon: mask blanks and pellicles

Mohammad Saghayezhian, Jojo Daof, Katrina Rook, Antonio Checco, Meng Lee, Marjorie Chee

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500X (2023) https://doi.org/10.1117/12.2687690
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Understanding the optical properties of carbon allotropes is important due to their high potential for EUV applications, both in reticle, as a capping layer and also in pellicle as a protective layer. Equally important is finding the effect of density, thickness and stress on the optical properties in the EUV range. It is well known that the density and stress of diamond-like carbon (DLC) thin films depend on the sp3/sp2 ratio, where higher sp3 ratio results in higher density and stress. While there have been some studies on EUV optical constants of different types DLC films, grown with different techniques, it is not clear how the EUV optical constants vary with sp3/sp2 ratio and density. Using single-bend pulsed filter cathodic arc and PVD thin films of DLC are prepared. The variations of refraction and extinction coefficients, as well as reflectivity are presented.

Citation Download Citation

Mohammad Saghayezhian, Jojo Daof, Katrina Rook, Antonio Checco, Meng Lee, and Marjorie Chee "The EUV optical constants of high and low density diamond-like carbon: mask blanks and pellicles", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500X (22 November 2023); https://doi.org/10.1117/12.2687690

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