A laboratory-based reflectometer designed for characterizing the reflectivity of optical coatings in 30- to 200-nm wavelength range was recently developed at IPOE. An RF-produced gas-discharge light source is applied to generate characteristic lines. The light source is mounted on a grazing incident monochromator with a 146-deg deviation angle between the incident and diffracted arms. By precisely adjusting the toroidal grating inside the monochromator chamber, monochromatic lights are acquired through the exit slit. A collimator mirror and two sets of collimation slits with 2  mm  ×  2  mm dimension are utilized for reducing the divergence of the beam incident on the sample. A high-precision six-axis translation stage, which allows a heavy sample with a maximum diameter of 100 mm, is used to control positions of the samples and the detector. A chopper disk used both for incident light intensity monitor and signal modulation is placed with an incidence angle of 70 deg relative to the incident light beam. The configuration, adjustment process, and test results of the reflectometer are presented in detail. The experimental reflectivity results for Al  /  LiF  /  MgF₂ film obtained from our laboratory and BESSY-II Synchrotron as well as Hefei Synchrotron Light Source are given and compared for demonstrating the reliability of the system.