Nanoparticle fabrication by geometrically confined nanosphere lithography

Ryan C. Denomme; Krishna Iyer; Michael Kreder; Brendan Smith; Patricia Nieva

doi:10.1117/1.JMM.12.3.031106

26 July 2013 Nanoparticle fabrication by geometrically confined nanosphere lithography

Ryan C. Denomme, Krishna Iyer, Michael Kreder, Brendan Smith, Patricia Nieva

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 031106 (July 2013). https://doi.org/10.1117/1.JMM.12.3.031106

Abstract

Arrays of metal nanoparticles, typically gold or silver, exhibit localized surface plasmon resonance, a phenomenon that has many applications, such as chemical and biological sensing. However, fabrication of metal nanoparticle arrays with high uniformity and repeatability, at a reasonable cost, is difficult. Nanosphere lithography (NSL) has been used before to produce inexpensive nanoparticle arrays through the use of monolayers of self-assembled microspheres as a deposition mask. However, control over the size and location of the arrays, as well as uniformity over large areas is poor, thus limiting its use to research purposes. In this paper, a new NSL method, called here geometrically confined NSL (GCNSL), is presented. In GCNSL, microsphere assembly is confined to geometric patterns defined in photoresist, allowing high-precision and large-scale nanoparticle patterning while still remaining low cost. Using this new method, it is demonstrated that 400 nm polystyrene microspheres can be assembled inside of large arrays of photoresist patterns. Results show that optimal microsphere assembly is achieved with long and narrow rectangular photoresist patterns. The combination of microsphere monolayers and photoresist patterns is then used as a deposition mask to produce silver nanoparticles at precise locations on the substrate with high uniformity, repeatability, and quality.

Citation Download Citation

Ryan C. Denomme, Krishna Iyer, Michael Kreder, Brendan Smith, and Patricia Nieva "Nanoparticle fabrication by geometrically confined nanosphere lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 031106 (26 July 2013). https://doi.org/10.1117/1.JMM.12.3.031106

Published: 26 July 2013

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