0.13mm photolithography using inverse Fourier transform convolution filtering

Chongxi Zhou; Xiangang Luo; Feng Boru

doi:10.1117/1.1308172

1 November 2000 0.13mm photolithography using inverse Fourier transform convolution filtering

Chongxi Zhou, Xiangang Luo, Feng Boru

Optical Engineering, Vol. 39, Issue 11, (November 2000). https://doi.org/10.1117/1.1308172

Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 µm is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3.

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Chongxi Zhou, Xiangang Luo, and Feng Boru "0.13mm photolithography using inverse Fourier transform convolution filtering," Optical Engineering 39(11), (1 November 2000). https://doi.org/10.1117/1.1308172

Published: 1 November 2000

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