Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

Weijie Shi; Xiangzhao Wang; Dongqing Zhang; Osami Sasaki

doi:10.1117/1.2202917

1 May 2006 Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Osami Sasaki

Author Affiliations +

Optical Engineering, Vol. 45, Issue 5, 053201 (May 2006). https://doi.org/10.1117/1.2202917

Abstract

A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, and Osami Sasaki "Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks," Optical Engineering 45(5), 053201 (1 May 2006). https://doi.org/10.1117/1.2202917

Published: 1 May 2006

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