Performance Testing Of The Waferwriter Tm Electron Beam Direct Write System

W. R. Livesay; J.Dennis Russell; Dave Harry; James S. Hulett; A. L. Rubiales; J. E. Wolfe

doi:10.1117/12.947480

20 June 1985 Performance Testing Of The Waferwriter Tm Electron Beam Direct Write System

W. R. Livesay, J.Dennis Russell, Dave Harry, James S. Hulett, A. L. Rubiales, J. E. Wolfe

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947480
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Performance tests on the Waferwriter TM system, a high brightness electron beam direct write system, are described. The Waferwriter system is an ultra-high current density, variable size round beam direct write system, capable of exposing existing popular photo-resists at higher rates than conventional shaped beam systems in the micron and submicron feature size range. Performance tests are described covering overlay accuracy, alignment, resolution, and throughput. The system is the first to meet the DoD's VHSIC requirements for E-beam direct write systems.

Citation Download Citation

W. R. Livesay, J.Dennis Russell, Dave Harry, James S. Hulett, A. L. Rubiales, and J. E. Wolfe "Performance Testing Of The Waferwriter Tm Electron Beam Direct Write System", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947480

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