Direct laser writing: virtual mask optimization for optical quality control artefact

Miikka Järvinen; Gianmario Scotti; Tuomas Vainikka; Edward Hæggström; Ivan Kassamakov

doi:10.1117/12.2280547

16 October 2017 Direct laser writing: virtual mask optimization for optical quality control artefact

Miikka Järvinen, Gianmario Scotti, Tuomas Vainikka, Edward Hæggström, Ivan Kassamakov

Proceedings Volume 10451, Photomask Technology 2017; 104511Q (2017) https://doi.org/10.1117/12.2280547
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Greyscale lithography is a way to fabricate 3D microstructures in the fields of micro-electro-mechanical systems (MEMS) and micro-optics. We use direct laser writing (DLW) to create a layered staircase sample for bio-microscopy use. To minimize the number of experiments necessary to determine the laser system parameters necessary to have the specified structure we used Design of Experiment (DOE) together with a 3D profiler using scanning white light interferometry (SWLI). A gray-scale mask with varying intensities was developed and used to pattern a thick positive tone photoresist. We employed a Microtech LW405 laser writer with a 405 nm GaN laser. Our results show the potential of the SWLI-DOE approach as a tool to optimize (precision, speed and structure) greyscale DLW lithography for the herein reported use. This work is a step towards replacing slow SEM and AFM devices for quality control in 3D MEMS production.

Citation Download Citation

Miikka Järvinen, Gianmario Scotti, Tuomas Vainikka, Edward Hæggström, and Ivan Kassamakov "Direct laser writing: virtual mask optimization for optical quality control artefact", Proc. SPIE 10451, Photomask Technology 2017, 104511Q (16 October 2017); https://doi.org/10.1117/12.2280547

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