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18 October 2019 EUVL: the natural evolution of optical microlithography
Bernd Geh
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Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 1095705 (2019) https://doi.org/10.1117/12.2515791
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
EUV Lithography is ready for High Volume Production, further enabling the printing of ever smaller features. In this keynote, the author will briefly reflect on evolution and future of digital technologies. An overview of the development and major milestones of Lithography lenses – with aberrations being a main focus – from the mid 1990 to today will be presented. Other aspects – like mask 3D effects, Source Mask Optimization, High NA EUV and Stochastic will be discussed.
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© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Bernd Geh "EUVL: the natural evolution of optical microlithography", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 1095705 (18 October 2019); https://doi.org/10.1117/12.2515791
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KEYWORDS
Extreme ultraviolet lithography
Optical lithography
Extreme ultraviolet
Photomasks
Source mask optimization
Image resolution
Lithographic lenses
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