PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The AIMS® EUV system represents a unique piece of the EUV mask infrastructure for the qualification of the mask printing performance in the aerial image. To meet the industry requirements in the future, ZEISS started the development of a next generation EUV mask review tool, the AIMS® EUV 3.0. The system is based on the best-in-class optical concept proven for the current generation. The tool will support 0.33NA isomorphic and 0.55NA anamorphic imaging from the beginning. In this paper, we will introduce the concept of the AIMS® EUV 3.0 and present the current development status.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Sven Krannich, Renzo Capelli, Matthias Stecher, Marc Schneider, Stefan Mueller, "AIMS® EUV 3.0: ZEISS’ next generation EUV mask review tool," Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC1249407 (30 April 2023); https://doi.org/10.1117/12.2658396