Chemically Vapor Deposited Silicon Carbide (SiC) For Optical Applications

Michael A. Pickering; Raymond L. Taylor; Joseph T. Keeley; George A. Graves

doi:10.1117/12.960942

26 October 1989 Chemically Vapor Deposited Silicon Carbide (SiC) For Optical Applications

Michael A. Pickering, Raymond L. Taylor, Joseph T. Keeley, George A. Graves

Proceedings Volume 1118, Space Optical Materials and Space Qualification of Optics; (1989) https://doi.org/10.1117/12.960942
Event: SPIE 1989 Technical Symposium on Aerospace Sensing, 1989, Orlando, FL, United States

Abstract

Important physical, optical, thermal, and mechanical properties of cubic (β) silicon carbide produced via a bulk chemical vapor deposition (CVD) process, developed at CVD Incorporated, are presented in this paper. The material's properties make it an ideal candidate material for optical components for LIDAR mirrors, solar collectors and concentrators, and astronomical telescopes. The CVD process has been scaled to produce large monolithic pieces of bulk SiC, i.e. disks up to 60-cm (24-in) diameter and plates up to 76-cm (30-in) long by 46-cm (18-in) wide with thickness up to 13 mm (0.5 in).

Citation Download Citation

Michael A. Pickering, Raymond L. Taylor, Joseph T. Keeley, and George A. Graves "Chemically Vapor Deposited Silicon Carbide (SiC) For Optical Applications", Proc. SPIE 1118, Space Optical Materials and Space Qualification of Optics, (26 October 1989); https://doi.org/10.1117/12.960942

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