Atomically precise digital e-beam lithography

J. N. Randall; J. H. G. Owen; E. Fuchs; R. Saini; R. Santini; S. O. R. Moheimani

doi:10.1117/12.2552083

23 March 2020 Atomically precise digital e-beam lithography

J. N. Randall, J. H. G. Owen, E. Fuchs, R. Saini, R. Santini, S. O. R. Moheimani

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113240X (2020) https://doi.org/10.1117/12.2552083
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Hydrogen Depassivation Lithography (HDL) is a version of electron beam lithography that uses scanning tunneling microscope (STM) instrumentation to expose a self–developing resist that is a monolayer of H chemisorbed to a Si (100) 2x1 H-passivated surface. Developed in the 1990s it has been largely a laboratory tool used in research for nanofabrication. The technique is capable of atomic resolution, the ability to remove single H atoms from the Si surface and has much higher precision than the best conventional e-beam lithography can possibly achieve exposing polymeric resists. However, its most promising attribute is that it can be used as a digital fabrication tool and is the first of a class of nanofabrication techniques that can be considered digital atomic scale fabrication technologies. Digital Atomic Scale Fabrication can be shown to have similar advantages over analog fabrication techniques that digital information technology has over analog information technology.

Conference Presentation

Citation Download Citation

J. N. Randall, J. H. G. Owen, E. Fuchs, R. Saini, R. Santini, and S. O. R. Moheimani "Atomically precise digital e-beam lithography", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240X (23 March 2020); https://doi.org/10.1117/12.2552083

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