Poster + Paper
28 April 2023 Kinetic simulations of plasma dynamics in the EUV sources
Kirill V. Lezhnin, Samuel Totorica, Abdullah Hyder, John Sheil, Oscar O. Versolato, Ahmed Diallo, William Fox
Author Affiliations +
Conference Poster
Abstract
Fast ion debris generated in laser-tin droplet interaction is known to degrade the reflectivity of the EUV collector mirror, posing a challenge to the commercial use of the EUV source. In the present work, we conduct one-dimensional fully kinetic Particle-In-Cell simulations using PSC code that is capable of capturing fast ion debris formation. We discuss the progress in the implementation of physics modules for the PSC code that is required to replicate the EUV generation process in detail. We demonstrate decent agreement between our kinetic simulations and radiation hydrodynamics simulations in terms of macroscopic plasma parameters. We also discuss the role of the kinetic effects in EUV and next-generation BEUV sources.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kirill V. Lezhnin, Samuel Totorica, Abdullah Hyder, John Sheil, Oscar O. Versolato, Ahmed Diallo, and William Fox "Kinetic simulations of plasma dynamics in the EUV sources", Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI, 1249418 (28 April 2023); https://doi.org/10.1117/12.2658454
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KEYWORDS
Plasma

Simulations

Ions

Extreme ultraviolet

Laser radiation

Electrons

Pulsed laser operation

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