Curvilinear data representation and its impact on file size and lithographic performance

Jiuning Hu; Adam Lyons; Chris Spence; Kurt Wampler; Mahmoud Mohsen; Yen-Wen Lu; Rachit Gupta; Youping Zhang; Rafael Howell; Jun Ye

doi:10.1117/12.2658649

28 April 2023 Curvilinear data representation and its impact on file size and lithographic performance

Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jun Ye

Author Affiliations +

Proceedings Volume 12495, DTCO and Computational Patterning II; 1249506 (2023) https://doi.org/10.1117/12.2658649
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

As the industry is developing curvilinear mask solutions, some curvilinear post-OPC masks have been reported with file sizes in excess of 10 times the corresponding Manhattan post-OPC files, which can greatly impact mask data storage, transfer and processing. Some file size reduction utilizing spline fittings has been reported in mask post-processing. However, from an OPC perspective, mask post-processing is undesirable. In this study, we show that maintaining an adequate density of mask control points (MCPs) is key to achieving the desired on-wafer lithographic performance, regardless of whether the MCPs are connected by spline sections or piecewise-linear segments. Our results suggest that) may not offer clear lithographic performance or file size benefits. We will also offer some guidance for controlling piecewise-linear file size without compromising lithographic performance.

Conference Presentation

Citation Download Citation

Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, and Jun Ye "Curvilinear data representation and its impact on file size and lithographic performance", Proc. SPIE 12495, DTCO and Computational Patterning II, 1249506 (28 April 2023); https://doi.org/10.1117/12.2658649

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