Poster
30 April 2023 Track hardware as an EUV lithography booster: a deep-dive into SCREEN’s DT-3000 platform capabilities
Author Affiliations +
Conference Poster
Abstract
As technology nodes continue to scale down, the full ecosystem around Extreme Ultraviolet Lithography (EUVL) is becoming more mature and proactive in the anticipation of upcoming challenges. To keep up with the technology roadmap evolution, lithography track performance capabilities have also been rapidly expanding through the years and new modules are being specially designed to support the lithographic performance improvement of different materials. In this work, we showcase the capability of novel hardware solutions currently available on SCREEN’s DT-3000 coat-develop track system. Based on a holistic approach, we demonstrate how hardware development is still a key not only to improve process stability and drive down defectivity to historically low levels but also to boost other metrics such as line width roughness (LWR), defect-free process window, and pattern shape.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreia Santos, Wesley Zanders, Elke Caron, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Jelle Vandereyken, Lander Verstraete, and Hyo Seon Suh "Track hardware as an EUV lithography booster: a deep-dive into SCREEN’s DT-3000 platform capabilities", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249823 (30 April 2023); https://doi.org/10.1117/12.2658398
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KEYWORDS
Extreme ultraviolet lithography

Line width roughness

Lithography

Ecosystems

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