Paper
1 June 1990 High-power and narrow-band excimer laser with a polarization-coupled resonator
Nobuaki Furuya, Takuhiro Ono, Naoya Horiuchi, Keiichiro Yamanaka, Takeo Miyata
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Abstract
As a light source for deep submicron lithography the authors have developed a long life and high power KrF narrow band excimer laser by installing a polarization coupled resonator into the conventional narrow band excimer laser with intra-cavity etalons. A maximum output power of 1O. 5Yi with a low etalon-load of L5W arid a narrow spectral band-width of 24pm at 200Hz is obtained. The central wavelength is stabilized to within only 5pm and drift is not observed when increasing the repetition rate from 4Hz to 200Hz without a wavelength feedback loop system. Furthermore the etalon-life is expected to be drastically prolonged to over a billion pulses resulting from the reduction of the etalonload to only about 10 of that in a conventional laser. 2.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobuaki Furuya, Takuhiro Ono, Naoya Horiuchi, Keiichiro Yamanaka, and Takeo Miyata "High-power and narrow-band excimer laser with a polarization-coupled resonator", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20221
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Fabry–Perot interferometers

Excimer lasers

Mirrors

Resonators

Pulsed laser operation

Feedback loops

Laser stabilization

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