CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12751 > Article
Poster + Paper
21 November 2023 A simulation-based methodology to analyze the impact of edge-length on curvilinear mask accuracy
Kushlendra Mishra, Rachit Sharma, Ingo Bork, Mary Zuo, Christof Zillner
Author Affiliations +
Proceedings Volume 12751, Photomask Technology 2023; 127511E (2023) https://doi.org/10.1117/12.2687760
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States
Conference Poster
Abstract
While the curvilinear mask shapes generated by ILT improve the wafer lithography process window, the efficiency of mask data preparation steps and the MBMW data-path depends on the number of edges used to represent complex curvilinear shapes. Shape simplification methods have been shown to be effective in reducing the number of edges used to represent curvilinear mask data. In this paper, we present the development of an approach to analyze the impact of edge-length variation on curvilinear mask accuracy, which can be used as a practical guidance for edge-based representation of curvilinear shapes for a given mask process.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Kushlendra Mishra, Rachit Sharma, Ingo Bork, Mary Zuo, and Christof Zillner "A simulation-based methodology to analyze the impact of edge-length on curvilinear mask accuracy", Proc. SPIE 12751, Photomask Technology 2023, 127511E (21 November 2023); https://doi.org/10.1117/12.2687760
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 6 PAGES + POSTER
DOWNLOAD PAPER SAVE TO MY LIBRARY
DOWNLOAD
POSTER
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lithography
Process modeling
Error analysis
Printing
Electron beam lithography
Photomasks
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top