Presentation + Paper
12 March 2024 Femtosecond laser nanomachining of bulk fused silica
Author Affiliations +
Abstract
Femtosecond laser irradiation followed by chemical etching in NaOH is a material processing technique capable of creating hollow channels with submicrometric cross-sections, extending up to a millimeter in length. In this study, we unveil the fabrication conditions leading to an effective nano-structuring of bulk fused silica, overcoming the limitations of traditional machining techniques in terms of both minimum achievable dimensions and high aspect ratios.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Pasquale Barbato, Roberto Osellame, and Rebeca Martínez Vázquez "Femtosecond laser nanomachining of bulk fused silica", Proc. SPIE 12875, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIV, 128750D (12 March 2024); https://doi.org/10.1117/12.3000923
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KEYWORDS
Etching

Silica

Femtosecond phenomena

Laser irradiation

Fabrication

Polarization

Wet etching

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