Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Fumio Iwamoto; Yoshifumi Ueno; Shinji Nagai; Kenichi Miyao; Hideyuki Hayashi; Takuya Ishii; Tamotsu Abe; Hiroaki Nakarai; Takashi Saito

doi:10.1117/12.3010135

10 April 2024 Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito

Author Affiliations +

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 1295313 (2024) https://doi.org/10.1117/12.3010135
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Gigaphoton Inc. presents a Sn-LPP EUV light source for mask inspection tools. This light source uses a minimum-mass Sn droplet generator with an in-line Sn fuel supply system, a double-pulse laser irradiation scheme with precise shooting control and a debris mitigation technology with H2 buffer-gas flow. During 1500 hours of continuous operation, a brightness of 120W/mm2 sr at the plasma point, a stable EUV energy 3σ-value below 5% and a high availability of 99% have been obtained without reflectivity degradation of the EUV collector mirror. We are currently developing key components for higher repetition rate to further increase the brightness.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, and Takashi Saito "Development progress of Gigaphoton’s LPP EUV light source for inspection systems", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 1295313 (10 April 2024); https://doi.org/10.1117/12.3010135

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