The amazing 40 years and the future of CD-SEM technology

Andras E. Vladar

doi:10.1117/12.3016068

10 April 2024 The amazing 40 years and the future of CD-SEM technology

Andras E. Vladar

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 1295502 (2024) https://doi.org/10.1117/12.3016068
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Without critical dimensional scanning electron microscopes (CD-SEMs), modern microelectronics would have tremendously inferior performance and functionality. Since 1984, their history is closely tied to the phenomenal success of IC technology. Over the decades CD-SEMs rightly became indispensable for process development and control. The future of CD and other SEMs in the IC industry is bright, even if some of their physics limits are not very far away. A great deal of improvements can still be made, but the advancements require complete optimization of electron beam, its scanning, the sample-electron interaction, and the detection of generated signals.

Conference Presentation

Citation Download Citation

Andras E. Vladar "The amazing 40 years and the future of CD-SEM technology", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 1295502 (10 April 2024); https://doi.org/10.1117/12.3016068

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